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New boot with MRAM
Sandia National Laboratories and Pacific Northwest National
Laboratory developed a way to help next-generation computers to
boot up instantly, making entire memories immediately available
for use.
The
technique is able to deposit flat ultrathin metallic layers on very
thin oxide layers. The thinness of the deposition reduces material
cost and requires less electricity to produce more rapid magnetic
effects in the service of computer memory. The inexpensive innovation
also may produce better, less expensive catalysts for chemical reactions,
better ceramic/metal seals, and lead to improved nanodevices.
The technique eliminates the present-day hurdle of metal atoms
clustering together into three-dimensional islands when deposited
on oxide surfaces. These thick bumps of metal - similar to water
beads on a waxed car - are a problem because they produce poorly
crystallized metal films. These are relatively weak, require inefficiently
large amounts of material, and produce more heat because more electricity
is needed to produce variations in magnetic signals.
Neal Singer, from Sandia National Laboratories, explains how the
process works: "The findings may have the most immediate
bearing on magnetic tunnel junctions, slated for use in magneto-resistive
random access memory, or MRAM. MRAM will allow computers to store
information in a nonvolatile fashion, meaning that the information
is not lost when the computer is turned off. As a result, MRAM promises
a day when computers would boot up instantly once turned on, rather
than comparatively slowly while retrieving information from the
hard drive. Major corporations have begun developing MRAM modules
in hopes of generating robust nonvolatile memory in the next few
years. But growing an atomically flat, ultrathin film of metal on
top of any insulator material is a difficult feat. In a magnetic
tunnel junction, an ultrathin layer of insulator, typically aluminum
oxide with a thickness of less than or about 1 nanometer, is sandwiched
between layers of magnetic metal, such as cobalt or nickel-iron.
When current flows through the device, the magnetic orientation
of the two metal layers can be switched, resulting in different
values of the tunneling current. This creates an environment in
which 'bits' of computer memory can be stored".
Science magazine published in its latest issue the article of a
team led by Scott Chambers (picture), a chief scientist at Pacific
Northwest National Laboratory, which says that in 2000, Sandia solid-state
theorist Dwight Jennison approached Chambers with a theory that
the presence of hydroxyls - in effect, water fragments - would enhance
the binding of metals to oxide surfaces. Jennison calculated that
then certain metals would form flat films on sapphire (a phase of
aluminum oxide). Using a special synthesis technique he created,
Chambers and PNNL postdoctoral fellow Tim Droubay produced an atomically
flat film of cobalt on hydroxylated sapphire.
They found, as Jennison had suspected, that the cobalt accumulated
in layer-by-layer fashion, rather than clustering to form islands.
"Cobalt's interaction with oxide is so weak that it would
normally ball up when deposited," says Jennison. "However,
by changing the surface of the oxide, Scott discovered that cobalt
atoms can cause the release of a hydrogen gas molecule and the cobalt
atoms then become oxidized themselves - that is, they link up with
the newly available oxygens and end up strongly bound within the
top layer of the oxide. These are the anchors." These metal
atoms, embedded at scattered points within the top layer of the
oxide, amount to about one anchor for every ten oxygen atoms in
the top layer. These anchoring atoms bind other metallic atoms to
themselves and to each other just above the oxide surface, forming
a crystalline metallic layer.
Chambers says that the process uses equipment already in place
in chip manufacturing plants, so " "For industry, a
solution may be as simple as exposing the thin aluminum oxide films
to a low pressure of water vapor before adding a final cobalt layer".
The entire process may be done at room temperature, which is beneficial
since it is often important to avoid high temperatures in manufacturing.
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